精品文档---下载后可任意编辑AlxZn1-xO 薄膜的制备及光电性能的讨论的开题报告【摘要】AlxZn1-xO 是一种优秀的半导体材料，具有优异的光电性能和潜在的应用前景。本文将针对 AlxZn1-xO 薄膜的制备技术，以及对其光电性能的讨论展开探讨。采纳射频磁控溅射技术制备 AlxZn1-xO 薄膜，并通过扫描电子显微镜、透射电子显微镜等手段对其纳米结构和物理性质进行表征。同时，通过紫外-可见吸收光谱、电子顺磁共振等光谱学手段，分析其光电性能及其在光电器件上的潜在应用。【关键词】AlxZn1-xO；光电性能；制备技术；光电器件【Abstract】AlxZn1-xO is an excellent semiconductor material with excellent optoelectronic properties and potential application prospects. In this paper, we will focus on the preparation technology of AlxZn1-xO thin film and the study of its optoelectronic properties. The AlxZn1-xO thin films were prepared by radio frequency magnetron sputtering technology, and its nanostructure and physical properties were characterized by scanning electron microscopy, transmission electron microscopy and other means. At the same time, by means of ultraviolet-visible absorption spectroscopy, electron paramagnetic resonance and other spectroscopic techniques, the optoelectronic properties of AlxZn1-xO were analyzed and its potential applications in optoelectronic devices were explored.【Keywords】AlxZn1-xO; Optoelectronic properties; Preparation technology; Optoelectronic devices
