精品文档---下载后可任意编辑图形衬底结合液滴外延生长 InAs/GaAs 量子点、量子环的讨论的开题报告摘要 液滴外延生长技术是一种用于制备半导体纳米结构的重要方法
本文主要介绍了通过图形衬底结合液滴外延生长技术制备 InAs/GaAs 量子点和量子环的讨论
通过在不同阻挡层上浸镀固态金属液滴,在热解过程中形成 InAs 纳米点
通过控制衬底表面形貌,在衬底上形成周期性图形,进一步控制 InAs 纳米点的排列和分布,并通过增长 GaAs 壳层形成InAs/GaAs 量子点
本文还对量子点的光电性质进行了表征,并比较了图形衬底和常规衬底上制备的量子点的差异
结果表明,图形衬底可以显著提高量子点的发光强度和单色性,同时可以制备出高质量的 InAs/GaAs 量子环结构
关键词:液滴外延;图形衬底;InAs/GaAs 量子点;量子环;光电性质Abstract Liquid-phase epitaxy (LPE) is an important method for preparing semiconductor nanostructures
This paper mainly introduces the research on the preparation of InAs/GaAs quantum dots and quantum rings by combining patterned substrates with LPE technology
Solid metal droplets were deposited on different barrier layers to form InAs nanodots during the thermal decomposition process
By controlling the surface morpholo